High Purity Titanium Silicide Ti5Si3 Powder CAS 12067-57-1, 99%

Titanium Silicide, Ti5Si3, has excellent characteristics. The silicate is extremely versatile with its high melting point of 2 403 K, low density (4.32g/cm3) low resistance (50 –120mO*cm), high hardness (968 V), and high temperature endurance. Purity: 99%
Particle Size: 5-10um

About Titanium Silicide Ti5Si3 Puffer :
Ti5Si3 It has high high-temperature stability and high-temperature strength. Following is the sintering procedure: Mix Si powder with Ti powder, heated to 1350 - 1450. Heat preservation. Once the furnace has cooled to room temperature, then the sintered materials are added to anhydrousethanol. Next, the sealed container is filled with AR gas. Finally, the sealed vessel is fed into the high energy planetary ballmill. (Wet ball mill refinement is possible with this ball milling mixture.) After drying, the slurry was ground in a vacuum. Ti5Si3 powder This resulted from passing through a 130-mesh sieve.

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Titanium Silicide Ti5Si3 Pulver Product Performance:
Titanium Silicide, Ti5Si3, has excellent characteristics. It has high melting points (2403 K), low densities (4.3 g/cm3) low resistivity (50 to 120mO*cm), high toughness (968 HV), good resistance against high-temperature oxidation, and high heat strength.

Technical Parameters of Titanium Silicide Powder Ti5Si3:

Product name MF Purity Size of the particle Molecular weight Density The color of the sky
Titanium Silicide Ti5Si3 99% 5-10um 323.59 4.39 g/cm3 black

Titanium silicicide Ti5Si3 powder: Chemical composition
Ti5Si3 Ti Si P S Si Mg Fe
99% 73.6% 26.1% 0.012% 0.07% 0.006% 0.001% 0.12%

It is simple. Titanium Silicide Ti5Si3 Puffer Produced?
Ti5Si3 may be prepared in a number of ways. These include casting method or powder sintering process, rapid solidification technique, self-propagating ignition method, etc. However, these techniques can be prone to pollution due to their complex processing technology and low yield.
1. The invention is about a method to prepare trisilicate Pentatitanium intermetallic compound paste in a batch. This process includes the following steps.
(1) Ti5Si3 was made by vacuum-sintering. It is made by the combination of Si and Ti powders at a ratio of 3:15.
(2) Step 1: Place evenly-mixed Si powder and T powder into a vacuum furnace. Then, heat the oven to 1350-1450. Cool the furnace at room temperature.
(3) After preparing the sintered materials in step 2, anhydrousethanol was added to them and they were then placed into a tank. This sealed tank was placed in an AR gas-protected high-energy planetary mill and refined with the wet ballmill method.
(4) Ball milling slurry from Step 3 was vacuum dried, ground and Ti5Si3 powder obtained through a 130-mesh sieve.
2. This batch preparation method is for trisilicate intermetallic powder. It is described in Claim 1 as having the following characteristic: The vacuum degree in vacuum furnace (2) in said step (2) must be less than 1.0x10-2Pa.
3. Following the batch method for the preparation of trisilicate intermetallic compounds powder, as claimed in claim 1, these characteristics are: The temperature at 1350-1450 is reached at 20/min. It's then held for between 3-5 hours.
4. In claim 1, it is stated that batch preparation methods of trisilicate-intermetallic compound powder are described. The rotational speed for the planetary ballmill in step (3) is 300 to 500 RPM. Ball grinding takes 24-48 hours.
This batch method is for the preparation of trisilicate Penta–titanium intermetallic compounds powder according to the following molar ratio: 3:5 weighing Si and Ti powders as raw materials. After heating to 1350-1450 degrees, heat preservation and cooling, the mixture is transferred to a vacuum tank. (With AR gas as a protective gases, the tank is sealed into the high-energy planetary ball mill. Wet mill method was used for refinement.) Ti5Si3 was then a130 mesh sieve. This process eliminates many defects, such as the melting casting method or powder pressing sintering methods, rapid solidification technique and self spreading combustion method. These are difficult to clean up, have low yields, high processing technology, and can easily cause pollution. High purity, zero byproducts. The process can control the stoichiometric proportion of products.

Applicaciones Titanium Silicide Ti5Si3 Puffer :
Ti5Si3 titanium silicide is widely used for the manufacturing of MOS, MOSFET, and DRAM gates. Source/drain interconnects with ohmic contacts.
Packing and Shipping of Titanium Silicide Ti5Si3 Pulver:
Many types of packing are available depending on the amount Ti5Si3 titanium silicide powder.
Packaging of Titanium Silicide Ti5Si3 Powder: You can vacuum pack 100g, 500g, 1kg/bag or 25kg/barrel. Or as you request.
Powder shipping of Titanium Silicide Ti5Si3: Shipping by air, sea or express is possible as soon as payment receipt has been received.

Nanotechnology Co. Ltd. (), a global trusted supplier of chemicals and manufacturers, has over 12-years experience in producing super-high-quality chemicals.
High-quality products are what you want Ti5Si3 Pulver Please feel free and contact us to make an enquiry. ( brad@ihpa.net )

Titanium Silicide Properties

Other Titles Pentatitanium trisilicide
Compound Formula Ti5Si3
Molecular Weight 323.59
Appearance Gray Black Powder
Melting Point N/A
Boiling Point N/A
Density 4.39 g/cm3
Solubility of H2O N/A
Exact Mass 323.670515

Titanium Silicide Health & Safety Information

Signal word N/A
Hazard Statements N/A
Hazard Codes N/A
Risk Codes N/A
Safety statements N/A
Transport Information

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